Sputtered Co/Ti Film Directly Oxidized Forms High-κ CoTiO3

The Role of High-κ TiHfO Gate Dielectric in Sputtered ZnO Thin-Film Transistors

Canonical forms for free κ-semigroups

The implicit signature κ consists of the multiplication and the (ω − 1)-power. We describe a procedure to transform each κ-term over a finite alphabet A into a certain canonical form and show that different canonical forms have different interpretations over some finite semigroup. The procedure of construction of the canonical forms, which is inspired in McCammond’s normal form algorithm for ω-...

Electrical Properties of Thin-Film Capacitors Fabricated Using High Temperature Sputtered Modified Barium Titanate

Simple thin-film capacitor stacks were fabricated from sputter-deposited doped barium titanate dielectric films with sputtered Pt and/or Ni electrodes and characterized electrically. Here, we report small signal, low frequency capacitance and parallel resistance data measured as a function of applied DC bias, polarization versus applied electric field strength and DC load/unload experiments. Th...

Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba₀.96Ca0.04Ti0.82Zr0.18O₃ (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Film texture and cryst...

Modification of Thin Film Properties by Sputtered Particles

Irrespective of thin film preparation methods such as PVD and CVD, the thin film process comprises three elementary stages including decomposition, transport, and nucleation and growth mechanisms. Fig. 1 shows the flow chart of the thin film process, where starting materials are successively modified to the resulting films. In the first stage, starting materials in the form of gas, liquid or so...